Dislocation formation from a surface step in semiconductors:: An ab initio study -: art. no. 092105

被引:43
作者
Godet, J
Brochard, S
Pizzagalli, L
Beauchamp, P
Soler, JM
机构
[1] Univ Poitiers, UMR 6630, Met Phys Lab, F-86962 Futuroscope, France
[2] Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain
关键词
D O I
10.1103/PhysRevB.73.092105
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The role of a simple surface defect, such as a step, for relaxing the stress applied to a semiconductor, has been investigated by means of large-scale first-principles calculations. Our results indicate that the step is the privileged site for initiating plasticity, with the formation and glide of 60 degrees dislocations for both tensile and compressive deformations. We have also examined the effect of surface and step termination on the plastic mechanisms.
引用
收藏
页数:4
相关论文
共 49 条
  • [1] Selection of crack-tip slip systems in the thermal arrest of cleavage cracks in dislocation-free silicon single crystals
    Argon, AS
    Gally, BJ
    [J]. SCRIPTA MATERIALIA, 2001, 45 (11) : 1287 - 1294
  • [2] Atomistic calculation of the interaction between an edge dislocation and a free surface
    Aslanides, A
    Pontikis, V
    [J]. PHILOSOPHICAL MAGAZINE LETTERS, 1998, 78 (05) : 377 - 383
  • [3] BELTZ GE, 1995, MATER RES SOC SYMP P, V356, P93
  • [4] ON THE NUCLEATION OF DISLOCATIONS AT A CRYSTAL-SURFACE
    BELTZ, GE
    FREUND, LB
    [J]. PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1993, 180 (02): : 303 - 313
  • [5] Dislocation nucleation from surface steps:: atomistic simulation in aluminium
    Brochard, S
    Beauchamp, P
    Grilhé, J
    [J]. PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 2000, 80 (03): : 503 - 524
  • [6] Stress concentration near a surface step and shear localization
    Brochard, S
    Beauchamp, P
    Grilhé, J
    [J]. PHYSICAL REVIEW B, 2000, 61 (13): : 8707 - 8713
  • [7] STABILITIES OF SINGLE-LAYER AND BILAYER STEPS ON SI(001) SURFACES
    CHADI, DJ
    [J]. PHYSICAL REVIEW LETTERS, 1987, 59 (15) : 1691 - 1694
  • [8] Growth morphology evolution and dislocation introduction in the InGaAs/GaAs heteroepitaxial system
    Cullis, AG
    Pidduck, AJ
    Emeny, MT
    [J]. JOURNAL OF CRYSTAL GROWTH, 1996, 158 (1-2) : 15 - 27
  • [9] Stress relaxation and misfit dislocation nucleation in the growth of misfitting films: A molecular dynamics simulation study
    Dong, L
    Schnitker, J
    Smith, RW
    Srolovitz, DJ
    [J]. JOURNAL OF APPLIED PHYSICS, 1998, 83 (01) : 217 - 227
  • [10] Strain and strain relaxation in semiconductors
    Dunstan, DJ
    [J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 1997, 8 (06) : 337 - 375