Far-end crosstalk reduction in double-layered dielectric interconnects

被引：28
作者：
Gazizov, TR [1 ]
机构：
[1] Tomsk State Univ Control Syst & Radioelect, Tomsk 634050, Russia
来源：
IEEE TRANSACTIONS ON ELECTROMAGNETIC COMPATIBILITY | 2001年 / 43卷 / 04期
关键词：
coupled interconnects; double-layered dielectric; far-end crosstalk;
D O I：
10.1109/15.974636
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The problem of far-end crosstalk reduction is considered. Various cases of far-end crosstalk reduction in single and cascaded sections of two coupled interconnects in a double-layered dielectric environment are investigated by computer modeling of capacitive and inductive couplings and by simulation of far-end crosstalk waveforms.
引用
收藏
页码：566 / 572
页数：7
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