ELF magnetic field exposure system with feedback-controlled disturbance rejection

被引：0
作者：
Wang, PKC
机构：
[1] Department of Electrical Engineering, University of California, Los Angeles, CA
[2] Department of Electrical Engineering, University of California, Los Angeles
来源：
BIOELECTROMAGNETICS | 1997年 / 18卷 / 04期
关键词：
ELF magnetic field exposure systems; feedback control; disturbance rejection;
D O I：
10.1002/(SICI)1521-186X(1997)18:4<299::AID-BEM2>3.0.CO;2-Y
中图分类号：
Q [生物科学];
学科分类号：
07 ; 0710 ; 09 ;
摘要：
Extremely low-frequency (ELF) magnetic field exposure systems are usually subject to field disturbances induced by external sources. Here, a method for designing a feedback control system for cancelling the effect of external ELF magnetic field disturbances on the magnetic field over the exposure area is presented. This method was used in the design of a feedback-controlled exposure system for an inverted microscope stage. The effectiveness of the proposed feedback control system for disturbance rejection was verified experimentally and by means of computer simulation. (C) 1997 Wiley-Liss, Inc.
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页码：299 / 306
页数：8
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