High-reflectivity high-contrast grating focusing reflector on silicon-on-insulator wafer

被引:9
|
作者
Fang, Wenjing [1 ,2 ]
Huang, Yongqing [1 ,2 ]
Duan, Xiaofeng [1 ,2 ]
Liu, Kai [1 ,2 ]
Fei, Jiarui [1 ,2 ]
Ren, Xiaomin [1 ,2 ]
机构
[1] Beijing Univ Posts & Telecommun, Inst Informat Photon & Opt Commun, Beijing 100876, Peoples R China
[2] Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China
基金
高等学校博士学科点专项科研基金; 中国国家自然科学基金;
关键词
gratings; reflectors; polarization; SUBWAVELENGTH GRATINGS; THEORETICAL-ANALYSIS; DESIGN;
D O I
10.1088/1674-1056/25/11/114213
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
A high-contrast grating (HCG) focusing reflector providing phase front control of reflected light and high reflectivity is proposed and fabricated. Basic design rules to engineer this category of structures are given in detail. A 1550 nm TM polarized incident light of 11.86 mm in focal length and 0.8320 in reflectivity is obtained in experiment. The wavelength dependence of the fabricated HCGs from 1530 nm to 1580 nm is also tested. The test results show that the focal length is in the range of 11.81-12 mm, which is close to the designed focal length of 15 mm. The reflectivity is almost above 0.56 within a bandwidth of 50 nm. At a distance of 11.86 mm, the light is focused to a round spot with the highest concentration, which is much smaller than the size of the incident beam. The FWHM of the reflected light beam decreases to 120 nm, and the intensity increases to 1.18.
引用
收藏
页数:5
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