Laser-solid interaction and dynamics of laser-ablated materials

被引:35
作者
Chen, KR [1 ]
Leboeuf, JN [1 ]
Wood, RF [1 ]
Geohegan, DB [1 ]
Donato, JM [1 ]
Liu, CL [1 ]
Puretzky, AA [1 ]
机构
[1] OAK RIDGE NATL LAB,OAK RIDGE,TN 37831
关键词
D O I
10.1016/0169-4332(95)00463-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
An annealing model is extended to treat the vaporization process, and a hydrodynamic model describes the ablated material. We find that dynamic source and ionization effects accelerate the expansion front of the ablated plume with thermal vaporization temperature. The vaporization process and plume propagation in high background gas pressure are studied.
引用
收藏
页码:45 / 49
页数:5
相关论文
共 12 条
  • [1] Chrisey D. B., 1994, PULSED LASER DEPOSIT
  • [2] TIME-RESOLVED REFLECTIVITY MEASUREMENTS ON SILICON AND GERMANIUM USING A PULSED EXCIMER KRF LASER-HEATING BEAM
    JELLISON, GE
    LOWNDES, DH
    MASHBURN, DN
    WOOD, RF
    [J]. PHYSICAL REVIEW B, 1986, 34 (04): : 2407 - 2415
  • [3] ON THE DUAL ROLE OF THE KNUDSEN LAYER AND UNSTEADY, ADIABATIC EXPANSION IN PULSE SPUTTERING PHENOMENA
    KELLY, R
    [J]. JOURNAL OF CHEMICAL PHYSICS, 1990, 92 (08) : 5047 - 5056
  • [4] KELLY R, UNPUB SURF SCI
  • [5] KELLY R, UNPUB COMMUNICATION
  • [6] LANDAU LD, 1959, FLUID MECH, P357
  • [7] PULSED EXCIMER LASER ANNEALING OF ION-IMPLANTED SILICON - CHARACTERIZATION AND SOLAR-CELL FABRICATION
    LOWNDES, DH
    CLELAND, JW
    CHRISTIE, WH
    EBY, RE
    JELLISON, GE
    NARAYAN, J
    WESTBROOK, RD
    WOOD, RF
    NILSON, JA
    DASS, SC
    [J]. APPLIED PHYSICS LETTERS, 1982, 41 (10) : 938 - 940
  • [8] PRESS WH, 1989, NUMERICAL RECIPES, P267
  • [9] Sod G.A, 1978, J COMPUT PHYS, V27, P131
  • [10] VERTES A, 1994, AIP CONF P, V288, P275