Features of surface structuring of silicon (100) crystals by microwave plasma treatment in different gas environments

被引：0

作者：

Shanygin, V. Ya. ^{[1
]}

Yafarov, R. K. ^{[1
]}

机构：

[1] Russian Acad Sci, Kotelnikov Inst Radio Engn & Elect, Saratov Branch, Saratov, Russia

来源：

TECHNICAL PHYSICS LETTERS | 2013年 / 39卷 / 05期

关键词：

Plasma Treatment; Technical Physic Letter; Electron Cyclotron Resonance; Height Variation; Microwave Plasma;

D O I：

10.1134/S1063785013050106

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The laws of the effect of microwave plasma treatment modes on the surface nanomorphology of silicon single crystals with crystallographic orientation (100) with a natural oxide coating are studied. Model mechanisms of surface nanostructuring during plasma treatment in gas environments with different selectivities for the heterostructure material of the substrate are discussed.

引用

页码：405 / 408

页数：4

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