Fabrication of silicon solar cell with >18% efficiency using spin-on-film processing for phosphorus diffusion and SiO2/graded index TiO2 anti-reflective coating

被引:13
作者
Lee, Yi-Yu [1 ]
Ho, Wen-Jeng [1 ]
Yeh, Chien-Wu [1 ]
机构
[1] Natl Taipei Univ Technol, Dept Electroopt Engn, Taipei 10608, Taiwan
关键词
Anti-reflection coatings; External quantum efficiency; Graded index; Silicon solar cell; Spin on film; EMITTER; TEMPERATURE; DESIGN;
D O I
10.1016/j.apsusc.2015.05.058
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This study employed spin-on film (SOF) technology for the fabrication of phosphorus diffusion and multilayer anti-reflective coatings (ARCs) with a graded index on silicon (Si) wafers. Low cost and high efficiency solar cells are important issues for the operating cost of a photovoltaic system. SOF technology for the fabrication of solar cells can be for the achievement of this goal. This study succeeded in the application of SOF technology in the preparation of both phosphorus diffusion and SiO2/graded index TiO2 ARCs for Si solar cells. Optical properties of TiO2, SiO2, and multi-layer SiO2/TiO2 deposition by SOF are characterized. Electrical and optical characteristics of the fabricated solar cells are measured and compared. An impressive efficiency of 18.25% was obtained by using the SOF processes. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:20 / 24
页数:5
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