Influence of palladium precursors on oxidation of alumina-supported palladium

被引：4

作者：

Wang, CB ^{[1
]}

Huang, TH ^{[1
]}

机构：

[1] Natl Def Univ, Chung Cheng Inst Technol, Dept Appl Chem, Tao Yuan 33509, Taiwan

来源：

THERMOCHIMICA ACTA | 2002年 / 381卷 / 01期

关键词：

bulk; surface; oxidation; thermally activated processes; thermal properties;

D O I：

10.1016/S0040-6031(01)00640-2

中图分类号：

O414.1 [热力学];

学科分类号：

摘要：

The oxidation phenomena of alumina-supported palladium prepared from various precursors has been investigated by a simultaneous thermogravimetric analysis-differential scanning calorimetric (TGA-DSC) technique over a wide temperature range between 250 and 900 K. Three different temperature ranges were found in oxidation on Pd(C)/Al2O3: chemisorption of dioxygen at 250-300 K; penetration of adsorbed oxide ions into sublayers at temperature over 300 K and formation of a stable bulk oxide at 800 K. However, four different temperature ranges were found on Pd(N)/Al2O3: chemisorption of dioxygen at 250-300 K and further formation of unstable (PdO2)-O-s at 300-320 K; decomposition of (PdO2)-O-s into (PdxO)-O-s at 320-420 K; penetration of adsorbed oxide ions into sublayers at temperature over 420 K; and formation of a stable bulk oxide at 800 K. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：37 / 44

页数：8

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