High-Performance Molybdenum Disulfide Field-Effect Transistors with Spin Tunnel Contacts

被引:194
作者
Dankert, Andre [1 ]
Langouche, Lennart [1 ]
Kamalakar, Mutta Venkata [1 ]
Dash, Saroj Prasad [1 ]
机构
[1] Chalmers Univ Technol, Dept Microtechnol & Nanosci, SE-41296 Gothenburg, Sweden
关键词
MoS2; field-effect transistor; ferromagnetic contacts; magnetoresistance; spintronics; Schottky barrier; TRANSPORT; GRAPHENE; MOS2; MONOLAYER; SILICON; METAL; POLARIZATION; INJECTION;
D O I
10.1021/nn404961e
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Molybdenum disulfide has recently emerged as a promising two-dimensional semiconducting material for nanoelectronic, optoelectronic, and spintronic applications. Here, we investigate the field-effect transistor behavior of MoS2 with ferromagnetic contacts to explore its potential for spintronics. In such devices, we elucidate that the presence of a large Schottky barrier resistance at the MoS2/ferromagnet interface is a major obstacle for the electrical spin injection and detection. We circumvent this problem by a reduction in the Schottky barrier height with the introduction of a thin TiO2 tunnel barrier between the ferromagnet and MoS2. This results in an enhancement of the transistor on-state current by 2 orders of magnitude and an increment in the field-effect mobility by a factor of 6. Our magnetoresistance calculation reveals that such integration of ferromagnetic tunnel contacts opens up the possibilities for MoS2-based spintronic devices.
引用
收藏
页码:476 / 482
页数:7
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