H atom surface loss kinetics in pulsed inductively coupled plasmas

Pulsed plasmas are very powerful tools to investigate mechanisms. This paper is focused on H atom kinetics in low-pressure high-density inductively coupled pulsed plasmas. We explore pure H-2, H-2/N-2, CH4/H-2 and CH4/N-2 mixtures. These gas mixtures offer two very different kinds of wall conditions, which are stainless-steel and hydrocarbon-coated walls. It shows that H loss probability (beta) is sensitive to wall conditions. Efforts are made to understand beta evolutions with the different parameters. The effect of pressure in non-depositing plasmas is also investigated. Evolution of H atom surface loss probability is linked to ion flux measurements. Ion bombardment promotes H surface loss.