Substrate versus superstrate configuration for stable thin film silicon solar cells

被引：25

作者：

Kim, Ka-Hyun ^{[1
,2
]}

Kasouit, Samir ^{[2
]}

Johnson, Erik V. ^{[3
]}

Roca i Cabarrocas, Pere ^{[3
]}

机构：

[1] UNIST Adv Ctr Energy, KIER, Ulsan, South Korea

[2] TOTAL SA, Gas & Power R&D Div, Courbevoie, France

[3] Ecole Polytech, CNRS, UMR7647, Lab Phys Interfaces & Couches Minces, F-91128 Palaiseau, France

来源：

SOLAR ENERGY MATERIALS AND SOLAR CELLS | 2013年 / 119卷

关键词：

Hydrogen; Defect formation; Light-induced degradation; Amorphous silicon; Nanocrystalline; PECVD; HYDROGENATED AMORPHOUS-SILICON; ELEVATED-TEMPERATURES; DEGRADATION; DEPOSITION; DIFFUSION; SI;

D O I：

10.1016/j.solmat.2013.05.045

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

We report on the light-induced degradation kinetics of hydrogenated polymorphous silicon (pm-Si:H) solar cells having either substrate or superstrate device configuration. Both types of devices were exposed to light-soaking for 500 h. While pm-Si:H superstrate solar cells showed strong degradation (up to 60%) under mercury vapor lamp illumination, we have found that substrate structures are remarkably stable. The difference between the two types of devices is shown to be related to interface delamination which only occurs in superstrate devices. We further demonstrate a strong correlation between short-circuit current density decrease upon light-soaking and solar cell area loss. (C) 2013 Elsevier B.V. All rights reserved.

引用

页码：124 / 128

页数：5

共 22 条

[1]

Benagli S., 2009, 24th EU PVSEC, P21

[2] Effects of plasma processing on the microstructural properties of silicon powders [J].

Bertran, E. ;

Costa, J. ;

Sardin, G. ;

Campmany, J. ;

Andujar, J. L. ;

Canillas, A. .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 1994, 3 (03) :348-354

[3] Hydrogen collision model: Quantitative description of metastability in amorphous silicon [J].

Branz, HM .

PHYSICAL REVIEW B, 1999, 59 (08) :5498-5512

[4] A FULLY AUTOMATED HOT-WALL MULTIPLASMA-MONOCHAMBER REACTOR FOR THIN-FILM DEPOSITION [J].

CABARROCAS, PRI ;

CHEVRIER, JB ;

HUC, J ;

LLORET, A ;

PAREY, JY ;

SCHMITT, JPM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (04) :2331-2341

[5]

Cabarrocas PRI, 2002, THIN SOLID FILMS, V403, P39, DOI 10.1016/S0040-6090(01)01656-X

[6] Plasma enhanced chemical vapor deposition of amorphous, polymorphous and microcrystalline silicon films [J].

Cabarrocas, PRI .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 2000, 266 :31-37

[7]

CABARROCAS PRI, 1998, P 2 WORLD C EXH PHOT, P355

[8] Hydrogen ion motion in amorphous silicon solar cells at elevated temperatures [J].

Carlson, DE ;

Rajan, K .

APPLIED PHYSICS LETTERS, 1996, 69 (10) :1447-1449

[9]

Carlson DE, 1996, APPL PHYS LETT, V68, P28, DOI 10.1063/1.116745

[10] Geometrical optimization and electrical performance comparison of thin-film tandem structures based on pm-Si:H and mu c-Si:H using computer simulation [J].

Dadouche, F. ;

Bethoux, O. ;

Gueunier-Farret, M. E. ;

Johnson, E. V. ;

Roca i Cabarrocas, P. ;

Marchand, C. ;

Kleider, J. P. .

EPJ PHOTOVOLTAICS, 2011, 2

← 1 2 3 →