Optical broadband monitoring of conventional and ion processes

被引：68

作者：

Ristau, D ^{[1
]}

Ehlers, H ^{[1
]}

Gross, T ^{[1
]}

Lappschies, M ^{[1
]}

机构：

[1] Laser Zentrum Hannover, D-30419 Hannover, Germany

来源：

APPLIED OPTICS | 2006年 / 45卷 / 07期

关键词：

D O I：

10.1364/AO.45.001495

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

This contribution is focused on applications of spectroscopic methods for the precise control of deposition processes. Besides a monochromator system with a moving grating for the deep ultraviolet/vacuum ultraviolet (DUV/VUV) spectral range, two approaches are presented for online spectrophotometers with CCD arrays. The conventional spectrophotometer is considered for the operator-assisted deposition of fluoride coatings applied in the DUV/VUV range. The concepts with CCD arrays are combined with an advanced software tool for an automatic production of optical coatings. An ion-assisted deposition process and ion-beam sputtering are considered for rapid manufacturing of complex layer systems in the visible and near-infrared spectral ranges. The present contribution summarizes and discusses the major aspects of the described combinations. (c) 2006 Optical Society of America.

引用

页码：1495 / 1501

页数：7

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