Chlorine dissociation fraction in an inductively coupled plasma measured by ultraviolet absorption spectroscopy

被引:31
作者
Neuilly, F
Booth, JP
Vallier, L
机构
[1] Philips Res Leuven, B-3001 Louvain, Belgium
[2] Ecole Polytech, Lab Phys & Technol Plasmas, F-91128 Palaiseau, France
[3] Lab Technol Microelect, Grenoble, France
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 2002年 / 20卷 / 01期
关键词
D O I
10.1116/1.1430247
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Broadband ultraviolet absorption spectroscopy of the weak Cl-2 continuum between 250 and 400 nm was used to measure the molecular Cl-2 density in pure chlorine inductively coupled plasmas at pressures of 15-100 mTorr and radio-frequency (rf) power up to 800 W. The depletion of the Cl-2 density was greatest at high-rf power and low pressure, and reached 80% at 15 mTorr 800 W. A simple global model was developed to explain the variation of the Cl-2 dissociation rate as a function of source power and total gas pressure, and was in excellent agreement with the observations. (C) 2002 American Vacuum Society.
引用
收藏
页码:225 / 229
页数:5
相关论文
共 16 条
[1]   Absolute radical densities in etching plasmas determined by broad-band UV absorption spectroscopy [J].
Booth, JP ;
Cunge, G ;
Neuilly, F ;
Sadeghi, N .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (03) :423-430
[2]   Kinetic study of low energy argon ion-enhanced plasma etching of polysilicon with atomic/molecular chlorine [J].
Chang, JP ;
Arnold, JC ;
Zau, GCH ;
Shin, HS ;
Sawin, HH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (04) :1853-1863
[3]   Plasma-surface kinetics and feature profile evolution in chlorine etching of polysilicon [J].
Chang, JP ;
Mahorowala, AP ;
Sawin, HH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (01) :217-224
[4]   DETECTION OF CH3 DURING CVD GROWTH OF DIAMOND BY OPTICAL-ABSORPTION [J].
CHILDS, MA ;
MENNINGEN, KL ;
CHEVAKO, P ;
SPELLMEYER, NW ;
ANDERSON, LW ;
LAWLER, JE .
PHYSICS LETTERS A, 1992, 171 (1-2) :87-89
[5]   MEASUREMENT OF ABSOLUTE HYDROGEN DISSOCIATION IN A DIAMOND DEPOSITION SYSTEM [J].
CHILDS, MA ;
MENNINGEN, KL ;
TOYODA, H ;
UEDA, Y ;
ANDERSON, LW ;
LAWLER, JE .
PHYSICS LETTERS A, 1994, 194 (1-2) :119-123
[6]   Electron interactions with Cl2 [J].
Christophorou, LG ;
Olthoff, JK .
JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1999, 28 (01) :131-169
[7]   A simple optical emission method for measuring percent dissociations of feed gases in plasmas: Application to Cl-2 in a high-density helical resonator plasma [J].
Donnelly, VM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1996, 14 (03) :1076-1087
[8]   The recombination of chlorine atoms at surfaces [J].
Kota, GP ;
Coburn, JW ;
Graves, DB .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (01) :270-277
[9]   GLOBAL-MODEL OF AR, O-2, CL-2, AND AR/O-2 HIGH-DENSITY PLASMA DISCHARGES [J].
LEE, C ;
LIEBERMAN, MA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1995, 13 (02) :368-380
[10]   Diagnostics of chlorine inductively coupled plasmas. Measurement of electron temperatures and electron energy distribution functions [J].
Malyshev, MV ;
Donnelly, VM .
JOURNAL OF APPLIED PHYSICS, 2000, 87 (04) :1642-1649