共 16 条
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Kinetic study of low energy argon ion-enhanced plasma etching of polysilicon with atomic/molecular chlorine
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1997, 15 (04)
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Plasma-surface kinetics and feature profile evolution in chlorine etching of polysilicon
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1998, 16 (01)
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A simple optical emission method for measuring percent dissociations of feed gases in plasmas: Application to Cl-2 in a high-density helical resonator plasma
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,
1996, 14 (03)
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The recombination of chlorine atoms at surfaces
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1998, 16 (01)
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GLOBAL-MODEL OF AR, O-2, CL-2, AND AR/O-2 HIGH-DENSITY PLASMA DISCHARGES
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,
1995, 13 (02)
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