Using the macroscopic scale to predict the nano-scale behavior of YSZ thin films

被引:8
作者
Lamas, J. S. [1 ]
Leroy, W. P. [1 ]
Lu, Y. -G. [2 ]
Verbeeck, J. [2 ]
Van Tendeloo, G. [2 ]
Depla, D. [1 ]
机构
[1] Univ Ghent, Dept Solid State Sci, Res Grp DRAFT, B-9000 Ghent, Belgium
[2] Univ Antwerp, EMAT, B-2020 Antwerp, Belgium
基金
欧洲研究理事会;
关键词
YSZ thin films; Preferential orientation; Columnar behavior; Compositional gradient; Grain tilt; Stress-model; YTTRIA-STABILIZED ZIRCONIA; PREFERENTIAL ORIENTATION; ELECTRICAL-PROPERTIES; BIAXIAL ALIGNMENT; BUFFER LAYERS; DEPOSITION; ELECTROLYTES; DIFFRACTION;
D O I
10.1016/j.surfcoat.2013.10.034
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this work, Yttria-stabilized zirconia (YSZ) thin films were deposited using dual reactive magnetron sputtering. By varying the deposition conditions, the film morphology and texture of the thin films are tuned and biaxial alignment is obtained. Studying the crystallographic and microstructural properties of the YSZ thin films, a tilted columnar growth was identified. This tilt is shown to be dependent on the compositional gradient of the sample. The variation of composition within a single YSZ column measured via STEM-EDX is demonstrated to be equal to the macroscopic variation on a full YSZ sample when deposited under the same deposition parameters. A simple stress model was developed to predict the tilt of the growing columns. The results indicate that this model not only determines the column bending of the growing film but also confirms that a macroscopic approach is sufficient to determine the compositional gradient in a single column of the YSZ thin films. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:45 / 50
页数:6
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