High-reflectivity HfO2/SiO2 ultraviolet mirrors

被引：92
|
作者：
Torchio, P [1 ]
Gatto, A
Alvisi, M
Albrand, G
Kaiser, N
Amra, C
机构：
[1] Domaine Univ St Jerome, Inst Fresnel, UMR CNRS, Ecole Natl Super Phys Marseille, F-13397 Marseille 20, France
[2] Fraunhofer Inst Angew Opt & Feinmech, D-7745 Jena, Germany
来源：
APPLIED OPTICS | 2002年 / 41卷 / 16期
关键词：
D O I：
10.1364/AO.41.003256
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
High-reflectivity dense multilayer coatings were produced for the ultraviolet spectral region. Thin-film single layers and UV mirrors were deposited by ion plating and plasma ion-assisted deposition high-energetic technologies. Optical characterizations of HfO2 and SiO2 single layers are made. The optical constants obtained for these two materials are presented. HfO2 and SiO2 mirrors with a reflectance of similar to99% near 250 nm are reported. (C) 2002 Optical Society of America.
引用
收藏
页码：3256 / 3261
页数：6
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