Organic-inorganic hybrid resists for EUVL

被引：3

作者：

Singh, Vikram ^{[1
]}

Kalyani, Vishwanath ^{[2
]}

Satyanarayana, V. S. V. ^{[2
]}

Pradeep, Chullikkattil P. ^{[2
]}

Ghosh, Subrata ^{[2
]}

Sharma, Satinder ^{[1
]}

Gonsalves, Kenneth E. ^{[2
]}

机构：

[1] Indian Inst Technol, Sch Comp & Elect Engn, Mandi 175001, India

[2] IIT Mandi, Sch Bas Sci, Mandi 175001, India

来源：

ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXI | 2014年 / 9051卷

关键词：

Polyoxometalates; organic-inorganic hybrid materials; e-beam lithography;

D O I：

10.1117/12.2041907

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Herein, we describe preliminary results on organic-inorganic hybrid photoresists, capable of showing line patterns up to 16 nm under e-beam exposure studies, prepared by incorporating polyoxometalates (POMs) clusters into organic photoresist materials. Various Mo and W based clusters such as (TBA)(2)[Mo6O19], (TBA)(5)(H)[P2V3W15O62] and (TBA)(4)[P2Mo18O61] (where TBA = tetrabutyl ammonium counter ion) have been incorporated into PMMA matrix by mixing POM solutions and standard PMMA polymer in anisole (MW similar to 95000, MicroChem) in 1: 33 w/v ratio. E-beam exposure followed by development with MIBK solutions showed that these new organic-inorganic hybrid photoresists show good line patterns upto 16 nm, which were not observed in the case of control experiments done on pure PMMA polymer resist. The observed enhancement of resist properties in the case of hybrid resists could possibly be due to a combination of features imparted to the resist by the POM clusters such as increased sensitivity, etch resistance and thermal stability.

引用

页数：6

共 16 条

[1]

Ginsberg A. P., 1990, WILEY INTERSCIENCE, V27

[2]

Gonsalves K. E., 2006, U.S. Patent, Patent No. [7 008 749 B2, 7008749]

[3]

Gonsalves KE, 2001, ADV MATER, V13, P703, DOI 10.1002/1521-4095(200105)13:10<703::AID-ADMA703>3.0.CO

[4]

2-A

[5]

Heller A., 1993, U. S. Patent, Patent No. [5,178,989, 5178989]

[6] Comparison of the photoredox properties of polyoxometallates and semiconducting particles [J].

Hiskia, A ;

Mylonas, A ;

Papaconstantinou, E .

CHEMICAL SOCIETY REVIEWS, 2001, 30 (01) :62-69

[7] Development of an Inorganic Nanoparticle Photoresist for EUV, E-beam and 193 nm Lithography [J].

Krysak, Marie ;

Trikeriotis, Markos ;

Schwartz, Evan ;

Lafferty, Neal ;

Xie, Peng ;

Smith, Bruce ;

Zimmerman, Paul ;

Montgomery, Warren ;

Giannelis, Emmanuel ;

Ober, Christopher K. .

ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVIII, 2011, 7972

[8] Polyoxometalate clusters, nanostructures and materials: From self assembly to designer materials and devices [J].

Long, De-Liang ;

Burkholder, Eric ;

Cronin, Leroy .

CHEMICAL SOCIETY REVIEWS, 2007, 36 (01) :105-121

[9] Developing remote metal binding sites in heteropolymolybdates [J].

Marcoux, PR ;

Hasenknopf, B ;

Vaissermann, J ;

Gouzerh, P .

EUROPEAN JOURNAL OF INORGANIC CHEMISTRY, 2003, (13) :2406-2412

[10] Supramolecular metal oxides:: Programmed hierarchical assembly of a protein-sized 21 kDa [(C16H36N)19{H2NC(CH2O)3P2V3W15O59}4]5- polyoxometalate assembly [J].

Pradeep, Chullikkattil P. ;

Long, De-Liang ;

Newton, Graham N. ;

Song, Yu-Fei ;

Cronin, Leroy .

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 2008, 47 (23) :4388-4391

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