High temperature oxidation behavior of Ti0.5Al0.5N coating and Ti0.5Al0.4Si0.1N coating

被引：76
作者：
Zhu, Lihui [1 ]
Hu, Mingmei [1 ]
Ni, Wangyang [2 ]
Liu, Yixiong [2 ]
机构：
[1] Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China
[2] Kennametal Inc, Latrobe, PA 15650 USA
来源：
VACUUM | 2012年 / 86卷 / 12期
关键词：
TiAlSiN coating; TiAlN coating; Oxidation resistance; Diffusion coefficient; AL-SI-N; THERMAL-STABILITY; MECHANICAL-PROPERTIES; SUPERHARD COATINGS; MICROSTRUCTURE; RESISTANCE;
D O I：
10.1016/j.vacuum.2012.04.013
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Good oxidation resistance of hard coatings is important for cutting tools. Ti0.5Al0.5N coating and Ti0.5Al0.4Si0.1N coating were deposited by cathodic arc evaporation and their oxidation behavior at 850 degrees C, 900 degrees C and 1000 degrees C was compared. The effect of Si addition on the oxidation resistance of Ti0.5Al0.4Si0.1N was investigated. Results show that the oxidation resistance of Ti0.5Al0.4Si0.1N coating at 850-1000 degrees C is superior to Ti0.5Al0.5N coating. The improved oxidation resistance of Ti0.5Al0.4Si0.1N coating can be ascribed to the combined action of Al2O3 and SiO2 barrier layer, the reduction of columnar structure and the refinement of grains. In particular, Si addition increases the diffusion coefficient of Al and promotes the preferential formation of Al2O3 barrier layer. (C) 2012 Elsevier Ltd. All rights reserved.
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收藏
页码：1795 / 1799
页数：5
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