Fabrication of 10-nm-scale nanoconstrictions in graphene using atomic force microscopy-based local anodic oxidation lithography

被引：12

作者：

Arai, Miho ^{[1
]}

Masubuchi, Satoru ^{[1
,2
]}

Nose, Kenji ^{[1
]}

Mitsuda, Yoshitaka ^{[1
]}

Machida, Tomoki ^{[1
,2
]}

机构：

[1] Univ Tokyo, Inst Ind Sci, Meguro Ku, Tokyo 1538505, Japan

[2] Univ Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2015年 / 54卷 / 04期

基金：

日本学术振兴会;

关键词：

QUANTUM DOTS; ELECTRON;

D O I：

10.7567/JJAP.54.04DJ06

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We performed local anodic oxidation (LAO) lithography on monolayer graphene and highly oriented pyrolytic graphite (HOPG) using atomic force microscope (AFM). Auger electron spectroscopic measurements in the oxidized area formed on the HOPG revealed that the number of oxygen atoms systematically increased with the bias voltage applied to the AFM cantilever vertical bar V-tip vertical bar, which demonstrates the tunability of the extent of oxidation with vertical bar V-tip vertical bar. By optimizing the LAO conditions, we fabricated monolayer graphene nanoconstrictions with a channel width as small as 10 nm, which is the smallest graphene nanoconstriction so far achieved by utilizing AFM lithography techniques. (C) 2015 The Japan Society of Applied Physics

引用

页数：4

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