Micro gratings written in ZnO: Al thin films using picosecond UV-laser interference patterning

被引：8

作者：

Ring, Sven ^{[1
]}

Stannowski, Bernd ^{[1
]}

Fink, Frank ^{[2
]}

Schlatmann, Rutger ^{[1
,2
]}

机构：

[1] Helmholtz Zentrum Berlin Mat & Energie GmbH, D-12489 Berlin, Germany

[2] HTW Berlin Univ Appl Sci, D-12459 Berlin, Germany

来源：

PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS | 2013年 / 7卷 / 09期

关键词：

ZnO; thin films; surface texture; interference patterning; laser interference; FABRICATION;

D O I：

10.1002/pssr.201307254

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Diffraction micro gratings have been written in ZnO:Al thin films using a picosecond laser operating at 355 nm. Micro gratings of 20 mu m diameter with a period of 860 nm show a groove depth up to 120 nm. The total transmittance of square-centimeter-size grating-textured ZnO:Al films was almost unchanged after grating formation, while the sheet resistance increased moderately. The textured films reached haze values of 9% at 700 nm. This simple texturing method can be applied also to ZnO:Al films that cannot be texture etched. (c) 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

引用

页码：635 / 638

页数：4

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