A new silicon-mediated nitrogen to oxygen rearrangement

被引：0
|
作者：
Talami, S [1 ]
Stirling, CJM [1 ]
机构：
[1] Univ Sheffield, Dept Chem, Sheffield S3 7HF, S Yorkshire, England
来源：
CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE | 1999年 / 77卷 / 5-6期
关键词：
silicon migration; nitrogen to oxygen; penta coordinate intermediate;
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Migration of silicon from nitrogen to oxygen has been quantified with respect to the distance between migration termini, substituents at silicon, and substitution on the chain linking oxygen to nitrogen.
引用
收藏
页码：1105 / 1107
页数：3
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