Injection layer consisting of a two-layer material in a sequential photothermoplastic process

This paper proposes a two-layer injection structure for photothermoplastic (PTP) materials in the form of a thick barrier layer (Se+5% Te) with a thin generation layer (Se+40% Te) deposited on it. The dependence usually observed in a sequential PTP process, whereby the use of injection semiconductors whose sensitivity is shifted toward the red makes it impossible to obtain an image by thermal development, is absent for this structure. (C) 1996 The Optical Society of America.