Graphoepitaxy of sexithiophene on thermally oxidized silicon surface with artificial periodic grooves

被引:22
作者
Ikeda, Susumu
Saiki, Koichiro
Tsutsui, Ken
Edura, Tomohiko
Wada, Yasuo
Miyazoe, Hiroyuki
Terashima, Kazuo
Inaba, Katsuhiko
Mitsunaga, Toru
Shimada, Toshihiro
机构
[1] Univ Tokyo, Goldman Sch Frontier Sci, Dept Complex Sci & Engn, Kashiwa, Chiba 2778561, Japan
[2] Waseda Univ, Nanotechnol Res Lab, Shinjuku Ku, Tokyo 1620041, Japan
[3] Univ Tokyo, Goldman Sch Frontier Sci, Dept Adv Mat Sci, Kashiwa, Chiba 2778561, Japan
[4] Rigaku Corp, Akishima, Tokyo 1968666, Japan
[5] Univ Tokyo, Dept Chem, Bunkyo Ku, Tokyo 1130033, Japan
关键词
D O I
10.1063/1.2216375
中图分类号
O59 [应用物理学];
学科分类号
摘要
Graphoepitaxial growth of a sexithiophene (6T) thin film was achieved on a thermally oxidized silicon surface with artificial periodic grooves. The surface structure was fabricated by electron beam lithography and the thin film was grown by molecular beam deposition. A well-pronounced, in-plane oriented component ([010](6T)parallel to grooves) was identified by grazing incidence x-ray diffraction, though there also existed some randomly oriented 6T grains. Presence of the graphoepitaxial component was also confirmed by results of the orientational analysis of atomic force microscopy images. It was shown that the in-plane orientation control of organic semiconductors is possible using graphoepitaxy. (c) 2006 American Institute of Physics.
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页数:3
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