RF MEMS Switches Fabrication by using SU-8 Technology

被引：0
|
作者：
Lucibello, Andrea [1 ,2 ]
Proietti, Emanuela [1 ]
Giacomozzi, Flavio [3 ]
Marcelli, Romolo [1 ]
Bartolucci, Giancarlo [1 ,2 ]
De Angelis, Giorgio [1 ,2 ]
机构：
[1] CNR IMM Roma, Rome, Italy
[2] Univ Roma Tor Vergata, Dept Elect Engn, I-00173 Rome, Italy
[3] FBK Irst, Povo, Italy
来源：
2012 SYMPOSIUM ON DESIGN, TEST, INTEGRATION AND PACKAGING OF MEMS/MOEMS (DTIP) | 2012年
关键词：
RF MEMS; Switches; SU-8; SILICON; SYSTEMS;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this paper we present a novel process based on SU-8 technology for the fabrication of double clamped RF MEMS capacitive shunt switches in coplanar configuration. The key element of the exploited process is the MicroChem SU-8 2002 negative photoresist. The polymeric material is widely used in MEMS device processes because of its excellent thermal and chemical stability. In this paper, SU-8 polymer has been utilized in a double way to get suspended structures as double clamped beams: (i) SU-8 for the lateral supports, and (ii) as a sacrificial layer for the release of the suspended membrane. Preliminary RF tests on the manufactured switches have been done, and the measured electrical performances are in good agreement with the performed simulations.
引用
收藏
页码：234 / 239
页数：6
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