Effect of bias voltage on microstructure and mechanical properties of arc evaporated (Ti, Al)N hard coatings

被引:8
作者
Aliaj, F. [1 ]
Syla, N. [1 ]
Avdiaj, S. [1 ]
Dilo, T. [2 ]
机构
[1] Univ Prishtina, Dept Phys, Fac Math & Nat Sci, Prishtina 10000, Kosovo, Serbia
[2] Univ Tirana, Dept Phys, Fac Nat Sci, Tirana, Albania
关键词
Hard coatings; cathodic arc evaporation; GAXRD; hardness; (Ti; Al)N; N COATINGS; RESIDUAL-STRESS; PVD COATINGS; THIN-FILMS; (TI; AL)N; NANOCOMPOSITES; PERFORMANCE;
D O I
10.1007/s12034-013-0479-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In the present study, authors report on the effect that substrate bias voltage has on the microstructure and mechanical properties of (Ti, Al)N hard coatings deposited with cathodic arc evaporation (CAE) technique. The coatings were deposited from a Ti Al-0 center dot 5 (0 center dot 5) powder metallurgical target in a reactive nitrogen atmosphere at three different bias voltages: U (B) = -aEuro parts per thousand 25, -50 and -100 V. The coatings were characterized in terms of compositional, microstructural and mechanical properties. Microstructure of the coatings was investigated with the aid of X-ray diffraction in glancing angle mode, which revealed information on phase composition, crystallite size, stress-free lattice parameter and residual stress. Mechanical properties were deduced from nano-indentation measurements. The residual stress in all the coatings was compressive and increased with increasing bias voltage in a manner similar to that reported in literature for Ti-Al-N coatings deposited with CAE. The bias voltage was also found to significantly influence the phase composition and crystallite size. At -25 V bias voltage the coating was found in single phase fcc-(Ti, Al)N and with relatively large crystallites of similar to 9 nm. At higher bias voltages (-50 and -100 V), the coatings were found in dual phase fcc-(Ti, Al)N and fcc-AlN and the size of crystallites reduced to approximately 5 nm. The reduction of crystallite size and the increase of compressive residual stress with increasing bias voltage both contributed to an increase in hardness of the coatings.
引用
收藏
页码:429 / 435
页数:7
相关论文
共 24 条
[1]   Influence of bias variation on residual stress and texture in TiAIN PVD coatings [J].
Ahlgren, M ;
Blomqvist, H .
SURFACE & COATINGS TECHNOLOGY, 2005, 200 (1-4) :157-160
[2]   Influence of the nitrogen pressure on the structure and properties of (Ti,Al)N coatings deposited by cathodic vacuum arc PVD process [J].
Bujak, J ;
Walkowicz, J ;
Kusinski, J .
SURFACE & COATINGS TECHNOLOGY, 2004, 180 :150-157
[3]   OPTIMIZATION OF ARC EVAPORATED (TI,AL)N FILM COMPOSITION FOR CUTTING-TOOL APPLICATIONS [J].
COLL, BF ;
SATHRUM, P ;
FONTANA, R ;
PEYRE, JP ;
DUCHATEAU, D ;
BENMALEK, M .
SURFACE & COATINGS TECHNOLOGY, 1992, 52 (01) :57-64
[4]   EVALUATION OF EXISTING ION PLATING PROCESSES FOR THE DEPOSITION OF MULTICOMPONENT HARD COATINGS [J].
FRELLER, H ;
HAESSLER, H .
SURFACE & COATINGS TECHNOLOGY, 1988, 36 (1-2) :219-232
[5]  
ICDD, 1997, PDF 2 CD ROM
[6]   THE PREPARATION OF NACL-TYPE TI1-XALXN SOLID-SOLUTION [J].
INAMURA, S ;
NOBUGAI, K ;
KANAMARU, F .
JOURNAL OF SOLID STATE CHEMISTRY, 1987, 68 (01) :124-127
[7]   ION INDUCED STRESS GENERATION IN ARC-EVAPORATED TIN FILMS [J].
LJUNGCRANTZ, H ;
HULTMAN, L ;
SUNDGREN, JE ;
KARLSSON, L .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (02) :832-837
[8]  
Mayrhofer P H, 2006, J APPL PHYS, V100
[9]   The effects of bias voltage and annealing on the microstructure and residual stress of arc-evaporated Cr-N coatings [J].
Odén, M ;
Almer, J ;
Håkansson, G .
SURFACE & COATINGS TECHNOLOGY, 1999, 120 :272-276
[10]   AN IMPROVED TECHNIQUE FOR DETERMINING HARDNESS AND ELASTIC-MODULUS USING LOAD AND DISPLACEMENT SENSING INDENTATION EXPERIMENTS [J].
OLIVER, WC ;
PHARR, GM .
JOURNAL OF MATERIALS RESEARCH, 1992, 7 (06) :1564-1583