The Leakage Mechanism Study of Hump Reverse Current Observed in n+/p Salicided Junction

We have observed a hump structure in reverse current-voltage curve of n+/p shallow diode for both area and perimeter structures fabricated with the CMOS technology using cobalt (Co) salicide. Through analyzing the ratio of abnormal to inherent leakage current dependency on the applied voltage and temperature, we confirm that the leakage path is originated from the touch of CoSi points to barrier edge of the n+/p diode. Moreover, for perimeter structures, this leakage path exists both in the areal and peripheral region with a movable border between them.