Effects of substrate temperature on the properties of Alq3 amorphous layers prepared by vacuum deposition

被引：6

作者：

Chung, JM ^{[1
]}

Luo, YZ

Jian, ZA

Kuo, MC

Yang, CS

Chou, WC

Chiu, KC

机构：

[1] Chung Yuan Christian Univ, Dept Phys, Chungli 32023, Taiwan

[2] Chung Yuan Christian Univ, Ctr Nano Technol, Chungli 32023, Taiwan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2004年 / 43卷 / 4A期

关键词：

organic materials and devices; fabrication of films and layered structure; structure and properties of films;

D O I：

10.1143/JJAP.43.1631

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In this study. various Alq(3) amorphous layers are prepared by vacuum deposition at different substrate temperatures T-sub. The surface morphology, structural information, and electrical and optical properties of these as-deposited layers are studied by atomic force microscopy, X-ray diffraction, J-E curves, and photoluminescence studies, respectively. The optimum deposition conditions for Alq(3) amorphous layers with respect to T-sub are also discussed.

引用

页码：1631 / 1632

页数：2

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