Ester-type precursor of polyimide and photosensitivity

被引：35

作者：

Hou, HQ ^{[1
]}

Jiang, JG ^{[1
]}

Ding, MX ^{[1
]}

机构：

[1] Chinese Acad Sci, Changchun Inst Appl Chem, Changchun 130022, Peoples R China

来源：

EUROPEAN POLYMER JOURNAL | 1999年 / 35卷 / 11期

关键词：

photosensitive polyimide; ester-type precursor; synthesis; formulation;

D O I：

10.1016/S0014-3057(98)00290-0

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

In order to investigate the influence of the main chain structure and molecular weight on the sensitivity of photosensitive ester-type precursor of polyimide (photo-PAE), an improved method was used to synthesize several kinds of photo-PAEs with relatively high molecular weight. Their sensitivities (at 365 nm) were investigated, and it was found that some additives such as sensitizer and photoinitiator had the greatest influence on the sensitivity of photo-PAE, that the photo-PAE with BPDA and mPDA as the main chain structure had the best sensitivity (D-0.5: 5-10 mJ/cm(2)) among the studied photo-PAEs, and that the sensitivity did not significantly change with the change of inherent viscosity of photo-PAE. Meanwhile, the thermal imidization of these photo-PAEs was also investigated by means of TGA and IR analyses. Additionally, a discussion was made for formulation of PSPI resist. (C) 1999 Elsevier Science Ltd. All rights reserved.

引用

页码：1993 / 2000

页数：8

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