TiO2 nanotube layers:: Dose effects during nitrogen doping by ion implantation

被引：105
作者：
Ghicov, A
Macak, JM
Tsuchiya, H
Kunze, J
Haeublein, V
Kleber, S
Schmuki, P
机构：
[1] Univ Erlangen Nurnberg, Dept Mat Sci, Inst Surface Sci & Corros, WWIV LKO, D-91058 Erlangen, Germany
[2] Fraunhofer Inst Integrated Syst & Device Technol, Erlangen, Germany
来源：
CHEMICAL PHYSICS LETTERS | 2006年 / 419卷 / 4-6期
关键词：
D O I：
10.1016/j.cplett.2005.11.102
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
TiO2 nanotubes were produced by self-organized electrochemical oxidation of Ti. The tubes were N-ion implanted at two nominal fluencies, 1 x 10(15) and 1 x 10(16) ions/cm(2). Implantation was carried out into amorphous and crystalline (anatase) tubes. Photoelectrochemical, SEM and XRD measurements show successful doping at a dose of 1 x 10(16) ions/cm(2), however the ion implantation process causes strong structural alterations. Amorphous tubes show a disintegration of the morphological integrity, while anatase tubes are 'amorphized'. This amorphization leads to a decrease of photoresponse in the UV range, but the N-doping results in a strong sub-band gap response. (c) 2005 Elsevier B.V. All rights reserved.
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页码：426 / 429
页数：4
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