Coating of Highly Porous Fiber Matrices by Atomic Layer Deposition

被引：35

作者：

Kemell, Marianna ^{[1
]}

Ritala, Mikko ^{[1
]}

Leskela, Markku ^{[1
]}

Groenen, Roland ^{[2
]}

Lindfors, Sven ^{[3
]}

机构：

[1] Univ Helsinki, Dept Chem, FI-00014 Helsinki, Finland

[2] NV Bekaert SA, B-8550 Zwevegem, Belgium

[3] Picosun Oy, FI-02150 Espoo, Finland

来源：

CHEMICAL VAPOR DEPOSITION | 2008年 / 14卷 / 11-12期

基金：

芬兰科学院;

关键词：

Aluminum oxide; Atomic layer deposition; Iridium; Porous metals; Reactor comparison;

D O I：

10.1002/cvde.200800710

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The potential of atomic layer deposition (ALD) in the coating of highly porous, 0.5 mm thick, metal fiber matrices is explored. Three different reactor types are compared for ALD of Al2O3 thin films from trimethylaluminum and water. Both an evacuation-type and a flow-type process are successful in forming conformal Al2O3 coatings on the fibers. The coatings are able to protect the fibers against electrochemical corrosion and thermal oxidation. In addition, a metallic Ir thin film is deposited by ALD on one of the Al2O3-coated fiber matrices. This kind of a structure could be used, for example, as a catalytic filter.

引用

页码：347 / 352

页数：6

共 32 条

[1] Atomic layer deposition of noble metals:: Exploration of the low limit of the deposition temperature [J].

Aaltonen, T ;

Ritala, M ;

Tung, YL ;

Chi, Y ;

Arstila, K ;

Meinander, K ;

Leskelä, M .

JOURNAL OF MATERIALS RESEARCH, 2004, 19 (11) :3353-3358

[2]

[Anonymous], 1988, Microbeam Analysis

[3] Electro-conductive nanotubular sheet of indium tin oxide as fabricated from the cellulose template [J].

Aoki, Y ;

Huang, JG ;

Kunitake, T .

JOURNAL OF MATERIALS CHEMISTRY, 2006, 16 (03) :292-297

[4] Thermodynamics of solutions of trimethyl aluminum and trimethyl gallium with tetramethyl tin [J].

Baev, AK .

RUSSIAN JOURNAL OF COORDINATION CHEMISTRY, 2001, 27 (08) :598-601

[5]

BANHART J, 2008, PROG MATER SCI, V46, P559

[6] Ruthenium/aerogel nanocomposites via atomic layer deposition [J].

Biener, Juergen ;

Baumann, Theodore F. ;

Wang, Yinmin ;

Nelson, Erik J. ;

Kucheyev, Sergei O. ;

Hamza, Alex V. ;

Kemell, Marianna ;

Ritala, Mikko ;

Leskela, Markku .

NANOTECHNOLOGY, 2007, 18 (05)

[7] Exact replication of biological structures by chemical vapor deposition of silica [J].

Cook, G ;

Timms, PL ;

Spickermann, CG .

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 2003, 42 (05) :557-+

[8] Conformal coating on ultrahigh-aspect-ratio nanopores of anodic alumina by atomic layer deposition [J].

Elam, JW ;

Routkevitch, D ;

Mardilovich, PP ;

George, SM .

CHEMISTRY OF MATERIALS, 2003, 15 (18) :3507-3517

[9]

*ICDD, 060598 ICDD

[10] Transparent superhydrophobic surfaces by self-assembly of hydrophobic monolayers on nanostructured surfaces [J].

Kemell, M ;

Färm, E ;

Leskelä, M ;

Ritala, M .

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2006, 203 (06) :1453-1458

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