Influence of hydrogenation on the amorphous-to-crystalline phase transition characteristics of Ge2Sb2Te5 and Ge8Sb2Te11 thin films

被引:14
作者
Kim, Sung-Won [1 ]
Lim, Woo-Sik [1 ]
Kim, Tae-Wan [2 ]
Lee, Hyun-Yong [1 ]
机构
[1] Chonnam Natl Univ, Fac Appl Chem Engn, Kwangju 500757, South Korea
[2] Sejong Univ, Dept Adv Mat Engn, Seoul 143747, South Korea
关键词
Ge2Sb2Te5; Ge8Sb2Te11; hydrogenation; phase transformation; nano-pulse reflection;
D O I
10.1143/JJAP.47.5337
中图分类号
O59 [应用物理学];
学科分类号
摘要
The characteristics of amorphous-to-crystalline phase transformation in the hydrogenated Ge2Sb2Te5 and Ge8Sb2Te11 thin films were investigated by X-ray diffraction (XRD), optical transmittance (Top), and nano-pulse reflection response. The hydrogenation was conducted Under a H-2 pressure (P-H) of 20atm and an annealing temperature (T-a) of 100 and 200 degrees C. The incorporation of hydrogens into the chalcogenide films was verified by secondary ion mass spectrometry (SIMS) depth profile. The variation of H-signals in the SIMS profile was apparently compensated by the variation of Sb and Ge signals rather than by that of Te. The results measured in hydrogenated films were compared with those in the as-deposited and post-annealed films Lit T-a for 4h in pure N-2 atmosphere. The hydrogenation effects led to very different dependences between the Ge2Sb2Te5 and Ge8Sb2Te11 thin films. Amorphous-to-crystalline phase-transition speed was evaluated via nano-pulse reflection response measurement. The hydrogenation inhibited the transition of Ge2Sb2Te5 but hardly affected that of Ge8Sb2Te11. In particular, the arnorphous-to-crystalline transition in the hydrogenated Ge8Sb2Te11 film was very stable.
引用
收藏
页码:5337 / 5341
页数:5
相关论文
共 19 条
[1]   SIMS ANALYSIS OF DEUTERIUM DIFFUSION IN HYDROGENATED AMORPHOUS SILICON [J].
CARLSON, DE ;
MAGEE, CW .
APPLIED PHYSICS LETTERS, 1978, 33 (01) :81-83
[2]   LASER-INDUCED CRYSTALLIZATION PHENOMENA IN GETE-BASED ALLOYS .1. CHARACTERIZATION OF NUCLEATION AND GROWTH [J].
COOMBS, JH ;
JONGENELIS, APJM ;
VANESSPIEKMAN, W ;
JACOBS, BAJ .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (08) :4906-4917
[3]  
DENEUFVILLE JP, 1976, OPTICAL PROPERTIES S, pCH15
[4]  
Elliott S. R., 1990, PHYS AMORPHOUS MAT
[5]   VALENCE-ALTERNATION MODEL FOR LOCALIZED GAP STATES IN LONE-PAIR SEMICONDUCTORS [J].
KASTNER, M ;
ADLER, D ;
FRITZSCHE, H .
PHYSICAL REVIEW LETTERS, 1976, 37 (22) :1504-1507
[6]   Wet-etching selectivity of Ag-photodoped AsGeSeS thin films and the fabrication of a planar corrugated one-dimensional photonic crystal by a holographic method [J].
Lee, HY ;
Yao, TF .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (05) :2017-2023
[7]   Real-time photoluminescence evaluation of low-temperature photodarkening effect in amorphous SeGe [J].
Lee, HY ;
Song, JS ;
Yao, T .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (05) :2870-2873
[8]   Photoinduced transformations in amorphous Se75Ge25 thin film by XeCl excimer-laser exposure [J].
Lee, HY ;
Park, SH ;
Chun, JY ;
Chung, HB .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (10) :5381-5385
[9]   Low-energy focused-ion-beam exposure characteristics of an amorphous Se75Ge25 resist [J].
Lee, HY ;
Chung, HB .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (04) :818-822
[10]   Photoinduced dichroism and its low-temperature characteristics in obliquely deposited amorphous As-Ge-Se-S thin films [J].
Lee, HY ;
Chun, JY ;
Yeo, CH ;
Chung, HB .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (02) :485-491