High-temperature stability of amorphous Al2O3 deposited on Si and CeO2-stabilized ZrO2 by metalorganic chemical vapor deposition

被引：0

作者：

Meyer, JD ^{[1
]}

Lee, WY ^{[1
]}

机构：

[1] Stevens Inst Technol, Dept Mat Sci & Engn, Hoboken, NJ 07030 USA

来源：

PROPERTIES AND PROCESSING OF VAPOR-DEPOSITED COATINGS | 1999年 / 555卷

关键词：

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Aluminum acetylacetonate and water vapor were used to deposit an amorphous Al2O3 seal coating on Si and CeO2-stabilized ZrO2 (CSZ) produced by air plasma spray. The Al2O3 coating prepared at similar to 500 degrees C was similar to 2.5 mu m thick, uniform, and non-porous. The crystallization and adhesion characteristics of the Al2O3 coating were examined by thermally annealing the Al2O3-coated Si and CSZ substrates in air. The amorphous coating crystallized to metastable Al2O3 phases within 20 hours at temperatures as low as 700 degrees C. The coating on Si spalled upon annealing whereas the coating on CSZ did not spall, but microcracked extensively due to the significant volume shrinkage associated with crystallization.

引用

页码：103 / 107

页数：5

共 7 条

[1]

BEARDSLEY MB, 1909, P 1990 COAT ADV HEAT

[2] PROTECTIVE COATINGS IN THE GAS-TURBINE ENGINE [J].

DEMASIMARCIN, JT ;

GUPTA, DK .

SURFACE & COATINGS TECHNOLOGY, 1994, 68 :1-9

[3]

Fredriksson E., 1993, Journal of Chemical Vapor Deposition, V1, P333

[4] EFFECT OF WATER-VAPOR ON THE GROWTH OF ALUMINUM-OXIDE FILMS BY LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION [J].

KIM, JS ;

MARZOUK, HA ;

REUCROFT, PJ ;

ROBERTSON, JD ;

HAMRIN, CE .

THIN SOLID FILMS, 1993, 230 (02) :156-159

[5] PREPARATION OF ALUMINA COATINGS BY CHEMICAL VAPOR-DEPOSITION [J].

LUX, B ;

COLOMBIER, C ;

ALTENA, H ;

STJERNBERG, K .

THIN SOLID FILMS, 1986, 138 (01) :49-64

[6] ALUMINUM-OXIDE THIN-FILMS PREPARED BY CHEMICAL VAPOR-DEPOSITION FROM ALUMINUM ACETYLACETONATE [J].

MARUYAMA, T ;

ARAI, S .

APPLIED PHYSICS LETTERS, 1992, 60 (03) :322-323

[7]

YONUSHONIS TM, P 1990 COAT ADV HEAT

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