A new bottom-up methodology to produce silicon layers with a closed porosity nanostructure and reduced refractive index

被引:29
作者
Godinho, V. [1 ]
Caballero-Hernandez, J. [1 ]
Jamon, D. [2 ,3 ]
Rojas, T. C. [1 ]
Schierholz, R. [1 ]
Garcia-Lopez, J. [4 ]
Ferrer, F. J. [4 ]
Fernandez, A. [1 ]
机构
[1] Univ Seville, CSIC, Inst Ciencia Mat Sevilla, E-41092 Seville, Spain
[2] Univ Lyon, F-42023 St Etienne, France
[3] Univ St Etienne, EA 3523, LT2C, F-42000 St Etienne, France
[4] Ctr Nacl Aceleradores, E-41092 Seville, Spain
关键词
SIOXNY THIN-FILMS; POROUS SILICON; SOLAR-CELLS; ANTIREFLECTION COATINGS; MECHANICAL-PROPERTIES; SUPERHARD COATINGS; ANGLE DEPOSITION; SI; DEVICES; DESIGN;
D O I
10.1088/0957-4484/24/27/275604
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A new approach is presented to produce amorphous porous silicon coatings (a-pSi) with closed porosity by magnetron sputtering of a silicon target. It is shown how the use of He as the process gas at moderated power (50-150 W RF) promotes the formation of closed nanometric pores during the growth of the silicon films. The use of oblique-angle deposition demonstrates the possibility of aligning and orientating the pores in one direction. The control of the deposition power allows the control of the pore size distribution. The films have been characterized by a variety of techniques, including scanning and transmission electron microscopy, electron energy loss spectroscopy, Rutherford back scattering and x-ray photoelectron spectroscopy, showing the incorporation of He into the films (most probably inside the closed pores) and limited surface oxidation of the silicon coating. The ellipsometry measurements show a significant decrease in the refractive index of porous coatings (n(500) (nm) = 3.75) in comparison to dense coatings (n(500) (nm) = 4.75). The capability of the method to prepare coatings with a tailored refractive index is therefore demonstrated. The versatility of the methodology is shown in this paper by preparing intrinsic or doped silicon and also depositing (under DC or RF discharge) a-pSi films on a variety of substrates, including flexible materials, with good chemical and mechanical stability. The fabrication of multilayers of silicon films of controlled refractive index in a simple (one-target chamber) deposition methodology is also presented.
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页数:10
相关论文
共 30 条
[1]   Microstructural characterization of porous silicon for use in optoelectronic devices [J].
Abidi, D. ;
Romdhane, S. ;
Brunet-Bruneau, A. ;
Fave, J. -L. .
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2009, 45 (01) :10601p1-10601p7
[2]   Innovative design for optical porous silicon gas sensor [J].
Acquaroli, L. N. ;
Urteaga, R. ;
Koropecki, R. R. .
SENSORS AND ACTUATORS B-CHEMICAL, 2010, 149 (01) :189-193
[3]   Large-area 2D periodic crystalline silicon nanodome arrays on nanoimprinted glass exhibiting photonic band structure effects [J].
Becker, C. ;
Lockau, D. ;
Sontheimer, T. ;
Schubert-Bischoff, P. ;
Rudigier-Voigt, E. ;
Bockmeyer, M. ;
Schmidt, F. ;
Rech, B. .
NANOTECHNOLOGY, 2012, 23 (13)
[4]   The future of crystalline silicon films on foreign substrates [J].
Bergmann, RB ;
Werner, JH .
THIN SOLID FILMS, 2002, 403 :162-169
[5]  
Birner A, 2001, ADV MATER, V13, P377, DOI 10.1002/1521-4095(200103)13:6<377::AID-ADMA377>3.3.CO
[6]  
2-O
[7]   Macroporous Si as an absorber for thin-film solar cells [J].
Brendel, Rolf ;
Ernst, Marco .
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2010, 4 (1-2) :40-42
[8]   Silicon microcavity light emitting devices [J].
Chan, S ;
Fauchet, PM .
OPTICAL MATERIALS, 2001, 17 (1-2) :31-34
[9]   Synthesis and characterization of porous silicon layers for 1D photonic crystal application [J].
Dubey, R. S. ;
Gautam, D. K. .
OPTIK, 2011, 122 (06) :494-497
[10]   Macroporous silicon: efficient antireflective layer on crystalline silicon [J].
Fonthal, Faruk ;
Torres, Ivaldo ;
Rodriguez, Angel .
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2011, 22 (07) :895-900