Multiple-Beam Surface Plasmon Holographic Nanolithography

被引：3

作者：

Liang, Qiuqun ^{[1
,2
]}

Yu, Weixing ^{[1
]}

Wang, Taisheng ^{[3
]}

Liu, Hua ^{[3
]}

Xu, Wenbin ^{[3
]}

Piao, Renguan ^{[3
]}

Fu, Yongqi ^{[4
]}

机构：

[1] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Appl Opt, Changchun 130033, Jilin, Peoples R China

[2] Chinese Acad Sci, Grad Univ, Beijing 10039, Peoples R China

[3] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Optoelect Technol Ctr, Changchun 130033, Jilin, Peoples R China

[4] Univ Elect Sci & Technol China, Sch Phys Elect, Chengdu 610054, Sichuan Provinc, Peoples R China

来源：

PLASMONICS | 2013年 / 8卷 / 02期

基金：

中国国家自然科学基金;

关键词：

Surface plasmon; Multiple-beam holographic nanolithography; 2-D Bravais lattices; EVANESCENT-WAVE INTERFERENCE; LASER INTERFERENCE; LITHOGRAPHY; FABRICATION; GRATINGS;

D O I：

10.1007/s11468-012-9435-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Multiple-beam surface plasmon holographic nanolithography based on a hemispherical prism coupling configuration is numerically studied in this paper. The proposed configuration is systematically analyzed and optimized for the purpose of achieving five different two-dimensional Bravais lattices by means of adjusting the spatial distribution of three incident beams properly. Furthermore, it is shown that the variation in the relative phase between incident beams can give rise to rich periodic patterns when overlapping more than three beams for surface plasmon holographic nanolithography.

引用

页码：561 / 569

页数：9

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