A capacitor-less 1T-DRAM cell

被引:165
作者
Okhonin, S [1 ]
Nagoga, M
Sallese, JM
Fazan, P
机构
[1] Swiss Fed Inst Technol, LEG, CH-1015 Lausanne, Switzerland
[2] Innovat Silicon Solut, CH-2525 Le Landeron, Switzerland
关键词
DRAM; eDRAM; floating body effects; partially-depleted SOI MOSFET;
D O I
10.1109/55.981314
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A simple true 1 transistor dynamic random access memory (DRAM) cell concept is proposed for the first time, using the body charging of partially-depleted SOI devices to store the logic "1" or "0" binary states. This cell is two times smaller in area than the conventional 8F(2) 1T/1C DRAM cell and the process of its manufacturing does not require the storage capacitor fabrication steps. This concept will allow the manufacture of simple low cost DRAM and embedded DRAM chips for 100 and sub-100 nm generations.
引用
收藏
页码:85 / 87
页数:3
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