Electrical noise in Circular Gate Tunnel FET in presence of interface traps

被引:45
作者
Goswami, Rupam [1 ]
Bhowmick, Brinda [1 ]
Baishya, Srimanta [1 ]
机构
[1] Natl Inst Technol Silchar, Dept Elect & Commun Engn, Silchar 788010, Assam, India
关键词
Tunnel FET; Flicker noise; Diffusion noise; Generation-recombination noise; TCAD; TRANSISTORS; SIMULATION; MOBILITY; TFETS;
D O I
10.1016/j.spmi.2015.07.064
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
This paper presents a novel architecture of Tunnel Field Effect Transistor (TFET) with a circular gate and reports the effect of electrical noise on the device by comparing the results with a hetero-junction TFET. TCAD simulations involving uniform and Gaussian trap distribution conclude that the proposed Circular Gate TFET shows lesser values of noise spectral density than hetero-junction TFET. At lower frequencies, both generation-recombination noise and flicker noise dominate; at mid frequencies, only flicker noise contributes and at higher frequencies, diffusion noise dominates. Drain current in Circular Gate TFET is more prone to traps than Hetero-Junction TFET. The use of gate-drain underlap enhances the cut-off frequency of the CG-TFET in presence of Gaussian traps and makes it suitable for digital applications. (C) 2015 Elsevier Ltd. All rights reserved.
引用
收藏
页码:342 / 354
页数:13
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