Edge diffraction in Monte Carlo ray tracing

被引：23

作者：

Freniere, ER ^{[1
]}

Gregory, GG ^{[1
]}

Hassler, RA ^{[1
]}

机构：

[1] Lambda Res Corp, Littleton, MA 01460 USA

来源：

OPTICAL DESIGN AND ANALYSIS SOFTWARE | 1999年 / 3780卷

关键词：

ray tracing; diffraction; Monte Carlo; stray light analysis;

D O I：

10.1117/12.363773

中图分类号：

TP31 [计算机软件];

学科分类号：

081202 ; 0835 ;

摘要：

Monte Carlo ray tracing programs are now being used to solve many optical analysis problems in which the entire optomechanical system must be considered. In many analyses, it is desired to consider the effects of diffraction by mechanical edges. Smoothly melding the effects of diffraction, a wave phenomenon, into a ray-tracing program is a significant technical challenge. This paper discusses the suitability of several methods of calculating diffraction for use in Tay tracing programs. A method based on the Heisenberg Uncertainty Principle was chosen for use in TracePro, a commercial Monte Carlo ray tracing program, and is discussed in detail.

引用

页码：151 / 157

页数：7

共 13 条

[1]

[Anonymous], P SPIE

[2] GAUSSIAN LIGHT BEAMS WITH GENERAL ASTIGMATISM [J].