Formation of Ohmic Contacts to a Diamond-Like Carbon Layer Deposited on a Dielectric Diamond Substrate

被引：3
|
作者：
Okhapkin, A. I. [1 ]
Yunin, P. A. [1 ]
Arkhipova, E. A. [1 ]
Kraev, S. A. [1 ]
Korolyov, S. A. [1 ]
Drozdov, M. N. [1 ]
Shashkin, V. I. [1 ]
机构：
[1] Russian Acad Sci, Inst Phys Microstruct, Kstovskii Rayon 603950, Nizhny Novgorod, Russia
来源：
SEMICONDUCTORS | 2020年 / 54卷 / 09期
基金：
俄罗斯基础研究基金会;
关键词：
diamond-like carbon; ohmic contacts; plasma-chemical deposition; single-crystal diamond; thermal annealing; SURFACE; FILMS;
D O I：
10.1134/S1063782620090213
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
The fabrication process of ohmic contacts to a diamond-like carbon (DLC) layer is described with the sequential deposition of a Au/Mo/Ti metallic layer onto it. The contacts have good mechanical and adhesion properties. Their specific contact resistance is varied from 1.4 x 10(-4)to 6.4 x 10(-5)omega cm(2)depending on the DLC layer thickness. The temperature dependence of the layer film resistance is investigated. It is shown that thin DLC layers provide better characteristics of an ohmic contact due to their more uniform graphitization during thermal annealing.
引用
收藏
页码：1056 / 1058
页数：3
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