Intensified magneto-resistance by rapid thermal annealing in magnetite (Fe3O4) thin film on SiO2 glass substrate

We have observed large magneto-resistance (MR) intensified by rapid thermal annealing (RTA) in magnetite (Fe3O4) thin film (MTF) on SiO2 glass (a-SiO2) substrate. The MTF was produced by the RF magnetron sputtering method by using a magnetite target. The electrical resistivity (ER) of as-grown MTF (AG-MTF) showed the Mott's variable range hopping behavior, which implies that the AG-MTF is amorphous-like. Although the magneto-resistance (MR) ratio of bulk single crystal is very small except around the Verwey transition temperature (VTT), that of the AG-MTF showed moderately large below room temperature. Due to RTA of the AG-MTF by use of an IR image furnace, the MR ratio of MTFs was intensified, and especially by the annealing around the Curie temperature (585 degrees C) of magnetite. Furthermore the ER of the rapid thermally annealed MTF (RTA-MTF) showed a slight kink at around the VTT, which indicates that the crystallinity of the RTA-MTF is higher than that of the AG-MTF. The MTF produced by the RF magnetron sputtering method are composed of magnetite fine particles (MFPs). We consider that the directions of magnetic moments of MFPs in the MTF were spatially randomized by the RTA and the strong spin scattering of itinerant electrons transferring between adjacent MFPs caused the intensification of the MR ratio.