Dedicated spectrophotometer for localized transmittance and reflectance measurements

被引：21

作者：

Abel-Tiberini, L ^{[1
]}

Lemarquis, F ^{[1
]}

Lequime, M ^{[1
]}

机构：

[1] Univ Paul Cezanne, UMR CNRS 6133, Inst Fresnel, F-13397 Marseille 20, France

来源：

APPLIED OPTICS | 2006年 / 45卷 / 07期

关键词：

D O I：

10.1364/AO.45.001386

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A dedicated spectrophotometer is built to achieve localized transmittance and reflectance measurements. The spatial resolution can be chosen from 100 mu m to 2 mm, the spectral resolution from 0.5 to 5 nm, and the spectral range from 400 to 1700 nm. This apparatus can be used to study the index and thickness uniformity on single layers to determine and optimize the characteristics of the deposition chamber. It can also be used to measure the spatial variations of optical properties of intended nonuniform coatings such as linear variable filters. (c) 2006 Optical Society of America.

引用

页码：1386 / 1391

页数：6

共 6 条

[1] AN IMPROVED METHOD FOR THE DETERMINATION OF THE EXTINCTION COEFFICIENT OF THIN-FILM MATERIALS [J].

BORGOGNO, JP ;

LAZARIDES, B ;

ROCHE, P .

THIN SOLID FILMS, 1983, 102 (03) :209-220

[2] SURFACE OPTICAL COATINGS BY ION ASSISTED DEPOSITION TECHNIQUES - STUDY OF UNIFORMITY [J].

FLORY, F ;

PELLETIER, E ;

ALBRAND, G ;

HU, Y .

APPLIED OPTICS, 1989, 28 (14) :2952-2959

[3] SYNTHESIS AND RESEARCH OF THE OPTIMUM CONDITIONS FOR THE OPTICAL MONITORING OF NON-QUARTER-WAVE MULTILAYERS [J].

GREZESBESSET, C ;

CHAZALLET, F ;

ALBRAND, G ;

PELLETIER, E .

APPLIED OPTICS, 1993, 32 (28) :5612-5618

[4]

GREZESBESSET C, 1995, THIN FILMS OPTICAL S, P249

[5]

Piegari A, 2003, P SOC PHOTO-OPT INS, V5250, P343

[6] Emission pattern of real vapor sources in high vacuum: an overview [J].

Villa, F ;

Pompa, O .

APPLIED OPTICS, 1999, 38 (04) :695-703

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