Selective-area atomic layer deposition with microcontact printed self-assembled octadecyltrichlorosilane monolayers as mask layers

被引：59

作者：

Farm, Elina ^{[1
]}

Kemell, Marianna ^{[1
]}

Ritala, Mikko ^{[1
]}

Leskela, Markku ^{[1
]}

机构：

[1] Univ Helsinki, Inorgan Chem Lab, Dept Chem, FI-00014 Helsinki, Finland

来源：

THIN SOLID FILMS | 2008年 / 517卷 / 02期

基金：

芬兰科学院;

关键词：

Selective-area atomic layer deposition; Self-assembled monolayer; Octadecyltrichlorosilane; Iridium; Titanium oxide;

D O I：

10.1016/j.tsf.2008.08.191

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Selective-area atomic layer deposition (ALD) was studied using microcontact printed self-assembled monolayers (SAM) as growth preventing mask layers. Patterned self-assembled octadecyltrichlorosilane (OTS, H(3)C(CH(2))(17)SiCl(3)) monolayers were prepared on the silicon (100) surface by an elastomeric stamp which had 1.5 mu m wide parallel print lines with 1.5 mu m wide spaces in between. Passivation properties of the monolayers against ALD growth were verified by ALD processes of iridium and TiO(2). Iridium was grown at 225 degrees C and TiO(2) at 250 degrees C. The quality of SAM was controlled by water contact angle measurements. Patterned iridium and TiO(2) films were studied with field emission scanning electron microscope and energy dispersive X-ray spectrometer. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：972 / 975

页数：4

共 21 条

[1] Atomic layer deposition of iridium thin films [J].

Aaltonen, T ;

Ritala, M ;

Sammelselg, V ;

Leskelä, M .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2004, 151 (08) :G489-G492

[2]

[Anonymous], 1988, Microbeam Analysis

[3] Chemistry for positive pattern transfer using area-selective atomic layer deposition [J].

Chen, R ;

Bent, SF .

ADVANCED MATERIALS, 2006, 18 (08) :1086-+

[4] Self-assembled monolayer resist for atomic layer deposition of HfO2 and ZrO2 high-κ gate dielectrics [J].

Chen, R ;

Kim, H ;

McIntyre, PC ;

Bent, SF .

APPLIED PHYSICS LETTERS, 2004, 84 (20) :4017-4019

[5] Self-assembled octadecyltrimethoxysilane monolayers enabling selective-area atomic layer deposition of iridium [J].

Farm, Elina ;

Kemell, Marianna ;

Ritala, Mikko ;

Leskela, Markku .

CHEMICAL VAPOR DEPOSITION, 2006, 12 (07) :415-+

[6] ALD resist formed by vapor-deposited self-assembled monolayers [J].

Hong, Junsic ;

Porter, David W. ;

Sreenivasan, Raghavasimhan ;

McIntyre, Paul C. ;

Bent, Stacey F. .

LANGMUIR, 2007, 23 (03) :1160-1165

[7] Spatial control over atomic layer deposition using microcontact-printed resists [J].

Jiang, Xirong ;

Chen, Rong ;

Bent, Stacey F. .

SURFACE & COATINGS TECHNOLOGY, 2007, 201 (22-23) :8799-8807

[8]

Joy DC., 1996, MONTE CARLO MODELING

[9] Hot microcontact printing for patterning ITO surfaces. Methodology, morphology, microstructure, and OLED charge injection barrier imaging [J].

Koide, Y ;

Such, MW ;

Basu, R ;

Evmenenko, G ;

Cui, J ;

Dutta, P ;

Hersam, MC ;

Marks, TJ .

LANGMUIR, 2003, 19 (01) :86-93

[10] Atomic layer deposition (ALD):: from precursors to thin film structures [J].

Leskelä, M ;

Ritala, M .

THIN SOLID FILMS, 2002, 409 (01) :138-146

← 1 2 3 →