Investigation of anisotropic wafer bending curvature in a-plane GaN films grown on r-plane sapphire substrates

被引:2
|
作者
Shon, J. W. [1 ]
Ohta, J. [1 ]
Inoue, S. [1 ]
Kobayashi, A. [1 ]
Fujioka, H. [1 ,2 ,3 ]
机构
[1] Univ Tokyo, Inst Ind Sci, Tokyo 1538505, Japan
[2] Japan Sci & Technol Corp JST, CREST, Chiyoda Ku, Tokyo 1020075, Japan
[3] Japan Sci & Technol Corp JST, ACCEL, Chiyoda Ku, Tokyo 1020075, Japan
关键词
Stresses; Physical vapor deposition processes; Nitride; Semiconducting gallium compounds; VAPOR-PHASE EPITAXY; THIN-FILMS; DEPOSITION; STRESSES;
D O I
10.1016/j.jcrysgro.2015.04.041
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We grew GaN films on r-plane sapphire substrates by pulsed sputtering and investigated their structural properties. X-ray diffraction measurements revealed that a-plane GaN grows epitaxially on r-plane sapphire with an epitaxial relation of GN [0001](GaN) // [(1) over bar 101](sapphire) and [(1) over bar 101](GaN) // [11 (2) over bar0](sapphire). In situ wafer curvature measurements revealed that the anisotropic compressive strain along [1 (1) over bar 00] and [0001](GaN) is generated during the initial stage of growth as a consequence of the anisotropy in the lattice mismatch between a-plane GaN and r-plane sapphire. We also observed that the coalescence of the GaN islands can lead to a change of stresses from compressive to tensile. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:11 / 13
页数:3
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