On the Mechanisms of Ni-Catalysed Graphene Chemical Vapour Deposition

被引：94

作者：

Weatherup, Robert S. ^{[1
]}

Bayer, Bernhard C. ^{[1
]}

Blume, Raoul ^{[2
]}

Baehtz, Carsten ^{[3
]}

Kidambi, Piran R. ^{[1
]}

Fouquet, Martin ^{[1
]}

Wirth, Christoph T. ^{[1
]}

Schloegl, Robert ^{[4
]}

Hofmann, Stephan ^{[1
]}

机构：

[1] Univ Cambridge, Dept Engn, Cambridge CB3 0FA, England

[2] Helmholtz Zentrum Berlin Mat & Energie, D-12489 Berlin, Germany

[3] Helmholtz Zentrum Dresden Rossendorf, Inst Ion Beam Phys & Mat Res, D-01314 Dresden, Germany

[4] Max Planck Gesell, Dept Inorgan Chem, Fritz Haber Inst, D-14195 Berlin, Germany

来源：

CHEMPHYSCHEM | 2012年 / 13卷 / 10期

基金：

英国工程与自然科学研究理事会; 欧洲研究理事会;

关键词：

chemical vapor deposition; graphene; nickel; photoelectron spectroscopy; X-ray diffraction; LARGE-AREA; FILMS; CARBON; SURFACE; GROWTH; TRANSITION;

D O I：

10.1002/cphc.201101020

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

How does your graphene grow? In situ X-ray photoelectron spectroscopy and X-ray diffraction measurements during chemical vapor deposition on Ni catalyst films show that graphene forms both isothermally and by precipitation on cooling (see picture). A coherent graphene growth model is devised and sub-surface dissolved carbon is shown to play an important role. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

引用

页码：2544 / 2549

页数：6

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