Broadband thin-film polarizer for 12 fs applications

被引：3

作者：

Habel, Florian ^{[1
,2
]}

Schneider, Waldemar ^{[1
,3
]}

Pervak, Vladimir ^{[1
,2
]}

机构：

[1] Univ Munich, D-85748 Garching, Germany

[2] Ultrafast Innovat GmbH, D-85748 Garching, Germany

[3] Max Planck Inst Quantum Opt, D-85748 Garching, Germany

来源：

OPTICS EXPRESS | 2015年 / 23卷 / 17期

关键词：

NEEDLE OPTIMIZATION TECHNIQUE; OPTICAL COATING DESIGN; PULSES; GENERATION; MIRRORS;

D O I：

10.1364/OE.23.021624

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A broadband non-dispersive thin-film polarizer for ultrafast applications is presented. The polarizer has a controllable flat-phase and a high extinction ratio of 23: 1 in the working bandwidth from 680 nm to 900 nm. This bandwidth allows supporting laser pulses down to 12 fs. The unavoidable mechanical stress of the interference coating is completely compensated by a specially designed antireflection coating on the second side of the substrate, allowing the use of thin substrates. (C) 2015 Optical Society of America

引用

页码：21624 / 21628

页数：5

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