Focus and edge detection algorithms and their relevance to the development of an optical overlay calibration standard

被引:20
作者
Fox, S [1 ]
Silver, RM [1 ]
Kornegay, E [1 ]
Dagenais, M [1 ]
机构
[1] Univ Maryland, College Pk, MD 20740 USA
来源
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIII, PTS 1 AND 2 | 1999年 / 3677卷
关键词
overlay metrology; focus; calibration; tool induced shift; TIS; microscope; metrology;
D O I
10.1117/12.350794
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present results of investigations into optical focus and edge detection algorithms relevant to overlay metrology. We compare gradient energy, standard deviation, contrast and summed intensity of acquired images as focus metrics for bright-field, scanning confocal (Nipkow disc), and confocal (single aperture) microscopy. For our purposes, gradient energy calculated via Sobel filtering was found to be the best criterion (of those tested) for an autofocus algorithm. We predict, based on theoretical results, that all of the focus algorithms we considered will focus in different heights relative to the object depending on the material properties of the object. Edge detection is accomplished via a window and spline technique for whole image data (e.g., charge-coupled device (CCD) array), and by application of a multiple line regression algorithm for single scan data (e.g., photometer). Measurements accomplished through these techniques are compared to state of the art scattering and analysis models.
引用
收藏
页码:95 / 106
页数:12
相关论文
共 14 条
[1]  
BERIZZI F, 1996, IEEE T AEROSPACE ELE, V32
[2]   Calibration of the automated z-axis of a microscope using focus functions [J].
Boddeke, FR ;
VanVliet, LJ ;
Young, IT .
JOURNAL OF MICROSCOPY-OXFORD, 1997, 186 :270-274
[3]   High-performance autofocus circuit for biological microscopy [J].
Bravo-Zanoguera, M ;
Von Massenbach, B ;
Kellner, AL ;
Price, JH .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1998, 69 (11) :3966-3977
[4]  
BULLIS WM, 1982, VLSI ELECTRONICS MIC, V3, pCH7
[5]  
KROTKOV E, 1987, INT J COMPUT VISION, V1, P223, DOI 10.1007/BF00127822
[6]  
LEE JH, 1995, IEEE T CONSUMER ELEC, V41
[7]  
NYYSSONEN D, 1979, SPIE, V194, P34
[8]  
Russ J.C., 2016, The image processing handbook, Vseventh
[9]   A method to characterize overlay tool misalignments and distortions [J].
Silver, RM ;
Potzick, J ;
Scire, F ;
Evans, C ;
McGlauflin, M ;
Kornegay, E ;
Larrabee, R .
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XI, 1997, 3050 :143-155
[10]  
*SPECT CO, METR METR LITH STIM