Iron-assisted ion beam patterning of Si(001) in the crystalline regime

被引：23

作者：

Macko, Sven ^{[1
]}

Grenzer, Joerg ^{[2
]}

Frost, Frank ^{[3
]}

Engler, Martin ^{[1
]}

Hirsch, Dietmar ^{[3
]}

Fritzsche, Monika ^{[2
]}

Muecklich, Arndt ^{[2
]}

Michely, Thomas ^{[1
]}

机构：

[1] Univ Cologne, Inst Phys 2, D-50937 Cologne, Germany

[2] Helmholtz Zentrum Dresden Rossendorf, Inst Ion Beam Phys & Mat Res, D-01314 Dresden, Germany

[3] Leibniz Inst Oberflachenmodifizierung eV, D-04318 Leipzig, Germany

来源：

NEW JOURNAL OF PHYSICS | 2012年 / 14卷

关键词：

FABRICATION; ARRAYS; CONES;

D O I：

10.1088/1367-2630/14/7/073003

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We present ion beam erosion experiments on Si(001) with simultaneous sputter co-deposition of steel at 660 K. At this temperature, the sample remains within the crystalline regime during ion exposure and pattern formation takes place by phase separation of Si and iron-silicide. After an ion fluence of F approximate to 5.9 x 10(21) ions m(-2), investigations by atomic force microscopy and scanning electron microscopy identify sponge, segmented wall and pillar patterns with high aspect ratios and heights of up to 200 nm. Grazing incidence x-ray diffraction and transmission electron microscopy reveal the structures to be composed of polycrystalline iron-silicide. The observed pattern formation is compared to that in the range of 140-440K under otherwise identical conditions, where a thin amorphous layer forms due to ion bombardment.

引用

页数：16

共 29 条

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