Phase transition induced double-Gaussian barrier height distribution in Schottky diode

被引:10
作者
Bobby, A. [1 ]
Verma, S. [2 ]
Asokan, K. [2 ]
Sarun, P. M. [1 ]
Antony, B. K. [1 ]
机构
[1] Indian Sch Mines, Dept Appl Phys, Dhanbad 826004, Bihar, India
[2] Inter Univ Accelerator Ctr, New Delhi 110067, India
关键词
Hg-nSi Schottky contacts; Interfacial conduction mechanism; Inhomogeneity; CAPACITANCE-VOLTAGE MEASUREMENTS; SERIES RESISTANCE; I-V; ELECTRON-TRANSPORT; INTERFACE STATES; MERCURY; SPECTROSCOPY; PARAMETERS; BEHAVIOR;
D O I
10.1016/j.physb.2013.08.037
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The charge transport mechanisms of Hg contact on n-type silicon crystal having < 1 0 0 > orientation were investigated in the temperature range of 160-293 K by the thermionic emission theory. The temperature variation of barrier height and ideality factor illustrates an inhomogeneous interlace with a Gaussian barrier height distribution. The plots of temperature dependent zero-bias barrier height, ideality factor, series resistance and reverse leakage current show a discontinuity below 240 K. The experimental barrier height and ideality factor versus 1/T plot gives two slopes, one in the 160-220 K region and the other in the 240-293 K region, thereby revealing a double Gaussian distribution of barrier heights. The observed discontinuity in the diode parameters and the existence of double Gaussian barrier heights are interpreted on the basis of phase transition of mercury from its liquid state to solid form. (C) 2013 Elsevier By. All rights reserved.
引用
收藏
页码:6 / 10
页数:5
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