The possibly important role played by Ga2O3 during the activation of GaN photocathode

Three different chemical solutions are used to remove the possible contamination on GaN surface, while Ga2O3 is still found at the surface. After thermal annealing at 710 degrees C in the ultrahigh vacuum (UHV) chamber and activated with Cs/O, all the GaN samples are successfully activated to the effective negative electron affinity (NEA) photocathodes. Among all samples, the GaN sample with the highest content of Ga2O3 after chemical cleaning obtains the highest quantum efficiency. By analyzing the property of Ga2O3, the surface processing results, and electron affinity variations during Cs and Cs/O-2 deposition on GaN of other groups, it is suggested that before the adsorption of Cs, Ga2O3 is not completely removed from GaN surface in our samples, which will combine with Cs and lead to a large decrease in electron affinity. Furthermore, the effective NEA is formed for GaN photocathode, along with the surface downward band bending. Based on this assumption, a new dipole model Ga2O3-Cs is suggested, and the experimental effects are explained and discussed. (C) 2015 AIP Publishing LLC.