共 30 条
Wavelength dependence of nanosecond laser induced surface damage in fused silica from 260 to 1550 nm
被引:4
作者:

Cao, Ming
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机构:
Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China

Cao, Jianjun
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机构:
Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China

Liu, Mian
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机构:
Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China

Sun, Yuan
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机构:
Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China

Wu, Meng
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机构:
Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China

Guo, Shiming
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Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China

Gao, Shumei
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Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China
机构:
[1] Jiangnan Univ, Sch Sci, Wuxi 214122, Peoples R China
基金:
中国国家自然科学基金;
关键词:
POLISHING-INDUCED CONTAMINATION;
THRESHOLD;
OPTICS;
FEMTOSECOND;
MITIGATION;
ABLATION;
DEFECTS;
DENSITY;
D O I:
10.1063/1.5015943
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
The wavelength dependence of laser induced surface damage in fused silica is experimentally studied in a wide wavelength range from 260 to 1550 nm. An optical parametric oscillator system is used to provide the tunable laser pulses with a duration of 5 ns. In the experiments, the exit surface of the silica slice is observed to be damaged prior to the entrance surface. The damage threshold decreases gradually as the wavelength decreases from 1550 to 324 nm and drops suddenly at 324 nm, which corresponds to a half of 7.66 eV. This wavelength dependence can be explained by a defect assisted multiphoton absorption mechanism. By fitting the experimental data with a power law equation, the damage threshold is found to be proportional to the 3.47-th power of wavelength in the range of 325-685 nm and 1.1-th power of wavelength in the range of 260-1550 nm. Published by AIP Publishing.
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