Rutile-type oxide-diluted magnetic semiconductor:: Mn-doped SnO2

被引:198
作者
Kimura, H [1 ]
Fukumura, T
Kawasaki, M
Inaba, K
Hasegawa, T
Koinuma, H
机构
[1] Tokyo Inst Technol, Dept Innovat & Engineered Mat, Yokohama, Kanagawa 2268502, Japan
[2] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
[3] Tokyo Inst Technol, Mat & Struct Lab, Yokohama, Kanagawa 2268503, Japan
[4] Tokyo Inst Technol, Frontier Collaborat Res Ctr, Yokohama, Kanagawa 2268503, Japan
[5] COMET, Tsukuba, Ibaraki 3050044, Japan
[6] Japan Sci & Technol Corp, CREST, Tokyo 1690072, Japan
关键词
D O I
10.1063/1.1430856
中图分类号
O59 [应用物理学];
学科分类号
摘要
Epitaxial films of an oxide-diluted magnetic semiconductor with rutile structure, Mn-doped SnO2, have been fabricated by pulsed-laser deposition. As the Mn content increases, systematic changes in lattice constants and in-gap absorption are observed. Magnetization measurements show almost paramagnetic behavior. The injection of n-type carrier over 10(20) cm(-3) is achieved by Sb doping. A Sn0.95Mn0.05O2:Sb film shows giant positive magnetoresistance as large as 60% at 5 K. (C) 2002 American Institute of Physics.
引用
收藏
页码:94 / 96
页数:3
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