Radiation-induced protective carbon coating for extreme ultraviolet optics

被引:31
作者
Klebanoff, LE [1 ]
Clift, WM
Malinowski, ME
Steinhaus, C
Grunow, P
Bajt, S
机构
[1] Sandia Natl Labs, Livermore, CA 94551 USA
[2] Lawrence Livermore Natl Lab, Livermore, CA 94551 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2002年 / 20卷 / 02期
关键词
D O I
10.1116/1.1463726
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A technique is described that uses radiation and a gas-phase species to produce a protective carbon coating on extreme ultravioles, (EUV) optics. A specific example is given in which a similar to5 Angstrom carbon coating is deposited on EUV Mo/Si optics via coexposure to radiation (EUV photons, electrons) and ethanol vapor. Auger electron spectroscopy, sputter Auger depth profiling, and EUV reflectivity measurements are presented that suggest a carbon coating that is substantially void free and protects the optic from water-induced oxidation at the water partial pressures used in the tests (similar to2 X 10(-7) Torr). The coating is also resistant to atmospheric degradation, and to gasification by the combination of electrons and molecular oxygen. The protective coating reduces the relative reflectivity (DeltaR/R-0) of an optic by similar to0.5%. (C) 2002 American Vacuum Society.
引用
收藏
页码:696 / 703
页数:8
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